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Fabrication of a uniform quantum dot film with a high quantum yieldoa mark
  • Oh, Min Woo ;
  • Son, Byung Hee ;
  • Yoon, Jee Sang ;
  • Yoo, Yonghwan ;
  • Kim, Yongduk ;
  • Choi, Soo Bong ;
  • Ahn, Yeong Hwan ;
  • Cho, Won Bae ;
  • Park, Doo Jae
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Publication Year
2024-10-29
Citation
Nanotechnology, Vol.36
Keyword
Bis (trimethylsilyl)amine (HMDS)ethyl acetatepolydimethylsiloxane (PDMS)quantum dotsquantum yielduniformity
All Science Classification Codes (ASJC)
BioengineeringChemistry (all)Materials Science (all)Mechanics of MaterialsMechanical EngineeringElectrical and Electronic Engineering
Abstract
We present a method that uses viscosity-lowering materials to fabricate flexible polydimethylsiloxane-based quantum dot (QD) films with high quantum yield (QY) and improved uniformity. We found that the aggregation of individual QDs was prevented, and the QY improved simultaneously in films that contained surfactants. These films showed an improved absorption of approximately 27% in the near-UV and blue light regions, along with an improved photoluminescence of approximately 18%, indicating improved light conversion from the UV to the visible frequency region.
ISSN
1361-6528
Language
eng
URI
https://dspace.ajou.ac.kr/dev/handle/2018.oak/34572
DOI
https://doi.org/10.1088/1361-6528/ad86c6
Type
Article
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Ahn, Yeonghwan Image
Ahn, Yeonghwan안영환
Department of Physics
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