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Tunable sub-threshold current firing via insulator-to-metal transition enabled by lithographic nanochannels for neuromorphic applications
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Publication Year
2024-10-01
Publisher
Elsevier Ltd
Citation
Applied Materials Today, Vol.40
Keyword
ClassificationDynamic memoryInsulator-to-metal transitionOn-demandSite-specific
Mesh Keyword
Dynamic memoryInsulator-to-metal transitionsITS applicationsNano channelsNeuromorphicOn demandsSite-specificSubthreshold currentTunablesVoltage limits
All Science Classification Codes (ASJC)
Materials Science (all)
Abstract
The electric field-driven insulator-to-metal transition (IMT) offers a promising platform for developing controllable, futuristic neuromorphic nanoelectronics. However, the volatile nature of IMT, typically stimulated by a specific threshold voltage, limits its potential use primarily to switch-like applications. To broaden its applications, including in-material data processing, achieving on-demand IMT activation with dynamic memory capability is essential. This study demonstrates on-demand modulation of IMT behavior using spatially confined VO2 nanochannels, designed by local probe lithography. This approach enables the integration of ultrafast (∼180 ns) volatile switches (on/off ratio >103) and memory storage, from short- to long-term, in a single device. Notably, the threshold voltage was effectively reduced from 5.6 V to 2.8 V by precisely modulating the width of spatially embedded VO2 nanochannels. The observed memory behavior is attributed to persistent metallic domains and preferential IMT along these channels, as confirmed by optical and Kelvin probe force microscopy. Furthermore, the ability to classify input patterns, even in the presence of noise, was demonstrated using interconnected coplanar nanochannels by leveraging the short-term memory characteristics of the IMT. This report marks a significant step towards on-demand nanoscale manipulation of the IMT dynamics, laying the groundwork for ultrasmall, high-speed, and energy-efficient conventional and neuromorphic nanoelectronics.
Language
eng
URI
https://dspace.ajou.ac.kr/dev/handle/2018.oak/34413
DOI
https://doi.org/10.1016/j.apmt.2024.102405
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Type
Article
Funding
No data was used for the research described in the article. This study was supported through the National Research Foundation of Korea [NRF- 2023R1A2C2003242, NRF-2022M3I7A3037878, RS-2024-00403069 and RS-2024-00336428] of the Ministry of Science and ICT, Republic of Korea.This study was supported through the National Research Foundation of Korea [ NRF- 2023R1A2C2003242 and NRF-2022M3I7A3037878 ] of the Ministry of Science and ICT, Republic of Korea.
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KUMARMOHITKumar, Mohit
Department of Materials Science Engineering
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