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Ultrahigh-Speed In-Memory Electronics Enabled by Proximity-Oxidation-Evolved Metal Oxide Redox Transistors
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dc.contributor.authorKumar, Mohit-
dc.contributor.authorKim, Unjeong-
dc.contributor.authorLee, Wang Gon-
dc.contributor.authorSeo, Hyungtak-
dc.date.issued2022-05-01-
dc.identifier.urihttps://dspace.ajou.ac.kr/dev/handle/2018.oak/32627-
dc.description.abstractThe pursuit of a universal device that combines nonvolatile multilevel storage, ultrafast writing/erasing speed, nondestructive readout, and embedded processing with low power consumption demands the development of innovative architectures. Although thin-film transistors and redox-based resistive-switching devices have independently been proven to be ideal building blocks for data processing and storage, it is still difficult to achieve both well-controlled multilevel memory and high-precision ultrafast processing in a single unit, even though this is essential for the large-scale hardware implementation of in-memory computing. In this work, an ultrafast (≈42 ns) and programable redox thin-film transistor (ReTFT) memory made of a proximity-oxidation-grown TiO2 layer is developed, which has on/off ratio of 105, nonvolatile multilevel analog storage with a long retention time, strong durability, and high reliability. Utilizing the proof-of-concept ReTFTs, circuits capable of performing fundamental NOT, AND, and OR operations with reconfigurable logic-in-memory processing are developed. Further, on-demand signal memory-processing operations, like multi-terminal addressable memory, learning, pattern recognition, and classification, are explored for prospective application in neuromorphic hardware. This device, which operates on a fundamentally different mechanism, presents an alternate solution to the problems associated with the creation of high-performing in-memory processing technology.-
dc.description.sponsorshipThis study was supported through the National Research Foundation of Korea [NRF\u20102018R1D1A1B07049871 and NRF\u20102019R1A2C2003804] of the Ministry of Science and ICT, Republic of Korea.-
dc.language.isoeng-
dc.publisherJohn Wiley and Sons Inc-
dc.subject.meshIn-memory processing-
dc.subject.meshMetal-oxide-
dc.subject.meshMulti terminals-
dc.subject.meshMultilevel storage-
dc.subject.meshNonvolatile-
dc.subject.meshProximity oxidation-
dc.subject.meshUltra high speed-
dc.subject.meshUltra-fast-
dc.subject.meshUltrafast memory-
dc.subject.meshUltrathin layers-
dc.titleUltrahigh-Speed In-Memory Electronics Enabled by Proximity-Oxidation-Evolved Metal Oxide Redox Transistors-
dc.typeArticle-
dc.citation.titleAdvanced Materials-
dc.citation.volume34-
dc.identifier.bibliographicCitationAdvanced Materials, Vol.34-
dc.identifier.doi10.1002/adma.202200122-
dc.identifier.pmid35288987-
dc.identifier.scopusid2-s2.0-85127446667-
dc.identifier.urlhttp://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1521-4095-
dc.subject.keywordin-memory processing-
dc.subject.keywordmulti-terminals-
dc.subject.keywordproximity oxidation-
dc.subject.keywordultrafast memory-
dc.subject.keywordultrathin layers-
dc.description.isoafalse-
dc.subject.subareaMaterials Science (all)-
dc.subject.subareaMechanics of Materials-
dc.subject.subareaMechanical Engineering-
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KUMARMOHITKumar, Mohit
Department of Materials Science Engineering
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