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DC Field | Value | Language |
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dc.contributor.author | Kumar, Mohit | - |
dc.contributor.author | Kim, Unjeong | - |
dc.contributor.author | Lee, Wang Gon | - |
dc.contributor.author | Seo, Hyungtak | - |
dc.date.issued | 2022-05-01 | - |
dc.identifier.uri | https://dspace.ajou.ac.kr/dev/handle/2018.oak/32627 | - |
dc.description.abstract | The pursuit of a universal device that combines nonvolatile multilevel storage, ultrafast writing/erasing speed, nondestructive readout, and embedded processing with low power consumption demands the development of innovative architectures. Although thin-film transistors and redox-based resistive-switching devices have independently been proven to be ideal building blocks for data processing and storage, it is still difficult to achieve both well-controlled multilevel memory and high-precision ultrafast processing in a single unit, even though this is essential for the large-scale hardware implementation of in-memory computing. In this work, an ultrafast (≈42 ns) and programable redox thin-film transistor (ReTFT) memory made of a proximity-oxidation-grown TiO2 layer is developed, which has on/off ratio of 105, nonvolatile multilevel analog storage with a long retention time, strong durability, and high reliability. Utilizing the proof-of-concept ReTFTs, circuits capable of performing fundamental NOT, AND, and OR operations with reconfigurable logic-in-memory processing are developed. Further, on-demand signal memory-processing operations, like multi-terminal addressable memory, learning, pattern recognition, and classification, are explored for prospective application in neuromorphic hardware. This device, which operates on a fundamentally different mechanism, presents an alternate solution to the problems associated with the creation of high-performing in-memory processing technology. | - |
dc.description.sponsorship | This study was supported through the National Research Foundation of Korea [NRF\u20102018R1D1A1B07049871 and NRF\u20102019R1A2C2003804] of the Ministry of Science and ICT, Republic of Korea. | - |
dc.language.iso | eng | - |
dc.publisher | John Wiley and Sons Inc | - |
dc.subject.mesh | In-memory processing | - |
dc.subject.mesh | Metal-oxide | - |
dc.subject.mesh | Multi terminals | - |
dc.subject.mesh | Multilevel storage | - |
dc.subject.mesh | Nonvolatile | - |
dc.subject.mesh | Proximity oxidation | - |
dc.subject.mesh | Ultra high speed | - |
dc.subject.mesh | Ultra-fast | - |
dc.subject.mesh | Ultrafast memory | - |
dc.subject.mesh | Ultrathin layers | - |
dc.title | Ultrahigh-Speed In-Memory Electronics Enabled by Proximity-Oxidation-Evolved Metal Oxide Redox Transistors | - |
dc.type | Article | - |
dc.citation.title | Advanced Materials | - |
dc.citation.volume | 34 | - |
dc.identifier.bibliographicCitation | Advanced Materials, Vol.34 | - |
dc.identifier.doi | 10.1002/adma.202200122 | - |
dc.identifier.pmid | 35288987 | - |
dc.identifier.scopusid | 2-s2.0-85127446667 | - |
dc.identifier.url | http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1521-4095 | - |
dc.subject.keyword | in-memory processing | - |
dc.subject.keyword | multi-terminals | - |
dc.subject.keyword | proximity oxidation | - |
dc.subject.keyword | ultrafast memory | - |
dc.subject.keyword | ultrathin layers | - |
dc.description.isoa | false | - |
dc.subject.subarea | Materials Science (all) | - |
dc.subject.subarea | Mechanics of Materials | - |
dc.subject.subarea | Mechanical Engineering | - |
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