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Multifunctional Nanohybrid of Alumina and Indium Oxide Prepared Using the Atomic Layer Deposition Technique
  • Duy, Le Thai ;
  • Kang, Hyunwoo ;
  • Shin, Hee Cheol ;
  • Han, Seunggik ;
  • Singh, Ranveer ;
  • Seo, Hyungtak
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dc.contributor.authorDuy, Le Thai-
dc.contributor.authorKang, Hyunwoo-
dc.contributor.authorShin, Hee Cheol-
dc.contributor.authorHan, Seunggik-
dc.contributor.authorSingh, Ranveer-
dc.contributor.authorSeo, Hyungtak-
dc.date.issued2021-12-15-
dc.identifier.urihttps://dspace.ajou.ac.kr/dev/handle/2018.oak/32424-
dc.description.abstractDeveloping new transparent conducting materials, especially those having flexibility, is of great interest for electronic applications. Here, our study on using the ozone-assisted atomic layer deposition (ALD) technique at a low temperature of 200 °C for making an ultrathin, transparent, flexible, and highly electroconducting nanohybrid of indium and aluminum oxides is introduced. Through various characterizations, measurements, and density functional theory-based calculations, excellent electrical conductivity (∼950 S cm-1), transparency (95% in the visible region), and flexibility (bendable angle of 130° for 10 000 cycles) of our nanohybrid oxide thin film with a total layer thickness below 15 nm (2-4 nm for alumina and 10 nm for indium oxide) have been revealed and discussed. Besides, potential sensing applications of our oxide films on a flexible substrate have been demonstrated, such as strain sensors, temperature sensors (25-100 °C, resolution of 0.1 °C), and NO2 gas sensors (0.35-3.5 ppm, optimum operation at 65-75 °C). With the great potential in not only transparent conducting oxide but also sensing applications, our multifunctional nanohybrid prepared using a simple ozone-assisted ALD route opens more room for the applicability of transparent and flexible electronics.-
dc.description.sponsorshipThe authors are very grateful for the financial support from the Basic Science Program (2018R1D1A1B07050008, 2019R1A2C2003804) and the Brain Pool Program (2018H1D3A1A02074733) through the National Research Foundation (NRF) of the Ministry of Science and ICT, Republic of Korea.-
dc.language.isoeng-
dc.publisherAmerican Chemical Society-
dc.subject.meshAtomic-layer deposition-
dc.subject.meshDeposition technique-
dc.subject.meshElectronics applications-
dc.subject.meshIndium oxide-
dc.subject.meshLows-temperatures-
dc.subject.meshNanohybrids-
dc.subject.meshSensing applications-
dc.subject.meshTCO-
dc.subject.meshTransparent conducting materials-
dc.subject.meshUltra-thin-
dc.titleMultifunctional Nanohybrid of Alumina and Indium Oxide Prepared Using the Atomic Layer Deposition Technique-
dc.typeArticle-
dc.citation.endPage59125-
dc.citation.startPage59115-
dc.citation.titleACS Applied Materials and Interfaces-
dc.citation.volume13-
dc.identifier.bibliographicCitationACS Applied Materials and Interfaces, Vol.13, pp.59115-59125-
dc.identifier.doi10.1021/acsami.1c18623-
dc.identifier.pmid34860496-
dc.identifier.scopusid2-s2.0-85120857284-
dc.identifier.urlhttp://pubs.acs.org/journal/aamick-
dc.subject.keywordaluminum oxide-
dc.subject.keywordatomic layer deposition-
dc.subject.keywordindium oxide-
dc.subject.keywordsensing-
dc.subject.keywordTCO-
dc.description.isoafalse-
dc.subject.subareaMaterials Science (all)-
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