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Femtojoule-Power-Consuming Synaptic Memtransistor Based on Mott Transition of Multiphasic Vanadium Oxides
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Publication Year
2021-11-01
Publisher
John Wiley and Sons Inc
Citation
Advanced Functional Materials, Vol.31
Keyword
fast switchinginterfacial Mott VSiO x channelmemtransistor devicesMott transitionsynaptic functionsvolatile thin film transistors
Mesh Keyword
Electrical characterizationLow bias voltageLow-power consumptionMemory applicationsMemory retentionMott transitionsResistive switching mechanismsTerminal measurements
All Science Classification Codes (ASJC)
Chemistry (all)Materials Science (all)Condensed Matter Physics
Abstract
To realize the potential of Mott transition of multiphasic vanadium oxides (VOx) for memory applications, the development of VOx memtransistors on SiO2 wafer is introduced. Through electrical characterizations, the volatile memory behaviors of the VOx memtransistors are observed in both two- and three-terminal measurements. Their capacitive memory and resistive switching mechanisms are strongly related to the mixed VOx/SiO2 interface (called VSiOx). VSiOx supports the Mott transition in VOx at low bias voltages (<0.5 V), leading to the low power consumption of the memtransistor. Moreover, the fast switching time (≈35 ns) and tunable memory retention with the synaptic functions (potentiation and depression) of the memtransistors (by using the gate and drain biases) are demonstrated. Overall, the findings open up major opportunities for constructing ultrafast and femto-joule power-consuming neuromorphic devices.
Language
eng
URI
https://dspace.ajou.ac.kr/dev/handle/2018.oak/32152
DOI
https://doi.org/10.1002/adfm.202102567
Fulltext

Type
Article
Funding
S.I. and L.T.D. contributed equally to this work. This study was supported through the National Research Foundation of Korea (NRF\u20102018R1D1A1B07049871, NRF\u20102019R1A2C2003804, NRF\u20102019M3F3A1A03079739) of the Ministry of Science and ICT, Republic of Korea. This work was also supported by Ajou University.
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KUMARMOHITKumar, Mohit
Department of Materials Science Engineering
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