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Gate-tunable photodetector and ambipolar transistor implemented using a graphene/MoSe2 barristoroa mark
  • Oh, Gwangtaek ;
  • Jeon, Ji Hoon ;
  • Kim, Young Chul ;
  • Ahn, Yeong Hwan ;
  • Park, Bae Ho
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Publication Year
2021-12-01
Publisher
Nature Research
Citation
NPG Asia Materials, Vol.13
Mesh Keyword
Ambipolar behaviorAmbipolar transistorsAmbipolar transportExternal quantum efficiencyHigh carrier mobilityPhotoresponsivityTransition metal dichalcogenidesTunable photodetectors
All Science Classification Codes (ASJC)
Modeling and SimulationMaterials Science (all)Condensed Matter Physics
Abstract
Next-generation electronic and optoelectronic devices require a high-quality channel layer. Graphene is a good candidate because of its high carrier mobility and unique ambipolar transport characteristics. However, the on/off ratio and photoresponsivity of graphene are typically low. Transition metal dichalcogenides (e.g., MoSe2) are semiconductors with high photoresponsivity but lower mobility than that of graphene. Here, we propose a graphene/MoSe2 barristor with a high-k ion-gel gate dielectric. It shows a high on/off ratio (3.3 × 104) and ambipolar behavior that is controlled by an external bias. The barristor exhibits very high external quantum efficiency (EQE, 66.3%) and photoresponsivity (285.0 mA/W). We demonstrate that an electric field applied to the gate electrode substantially modulates the photocurrent of the barristor, resulting in a high gate tuning ratio (1.50 μA/V). Therefore, this barristor shows potential for use as an ambipolar transistor with a high on/off ratio and a gate-tunable photodetector with a high EQE and responsivity.
Language
eng
URI
https://dspace.ajou.ac.kr/dev/handle/2018.oak/31801
DOI
https://doi.org/10.1038/s41427-021-00281-4
Fulltext

Type
Article
Funding
This work was supported by National Research Foundation of Korea (NRF) grants funded by the Korean government (MSIP) (No. 2013R1A3A2042120) and the KIST Institutional Program (No. 2E30410-20-085).
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