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Synthesis of CuxS Thin Films with Tunable Localized Surface Plasmon Resonances
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Publication Year
2018-06-07
Publisher
Wiley-Blackwell
Citation
ChemistrySelect, Vol.3, pp.5920-5926
Keyword
copper sulfidelocalized surface plasmon resonancesp-typetunable LSPRvalency
All Science Classification Codes (ASJC)
Chemistry (all)
Abstract
In this work, we report the fabrication of copper sulfide (CuS, Cu1.39S, and Cu2S) thin films with tunable localized surface plasmon resonance (LSPR). The thin films were synthesized by keeping the Cu precursor concentration constant and varying that of sodium thiosulfate, which dictated the final CuxS product. CuS showed the highest intensity LSPR peak and its intensity decreased with the increasing incorporation of Cu, as in the case of Cu1.39S, and vanished for the Cu-rich Cu2S, indicating carrier concentration-dependent plasmonic absorption. The shift in the XRD peak positions towards a lower degree and the increase in the d-spacing values for CuS indicated the intercalation of Cu species in the initial covellite lattice, yielding Cu1.39S and Cu2S in the process. XPS valence band edge studies revealed that among the synthesized CuxS thin films, CuS showed a stronger p-type as compared to Cu1.39S and Cu2S.
ISSN
2365-6549
Language
eng
URI
https://dspace.ajou.ac.kr/dev/handle/2018.oak/30256
DOI
https://doi.org/10.1002/slct.201800441
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Type
Article
Funding
This work was supported by the National Research Foundation (NRF) (NRF-2015R1 A2 A2 A01003790 and 2017R1D1 A1B03035201) of Ministry of Science and ICT, Repub-lic of Korea.
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SEO, HYUNGTAK서형탁
Department of Materials Science Engineering
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