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First Demonstration of Thermally Stable Zr:HfO2Ferroelectrics via Inserting AlN Interlayer- Lee, Sangmok;
- Kim, Giuk;
- Lee, Sangho;
- Shin, Hunbeom;
- Lim, Youngjin;
- Kim, Kang;
- Kim, Do Hyung;
- Oh, Il Kwon;
- Ko Park, Sang Hee;
- Ahn, Jinho;
et al
- 2024-01-01
- IEEE Electron Device Letters, Vol.45 No.9, pp.1578-1581
- Institute of Electrical and Electronics Engineers Inc.
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