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Showing results 1 to 2 of 2

Characterization of broadband dielectric properties of aerosol-deposited Al2O3 thick films
  • Kwon, Oh Yun;
  • Lee, Dong Won;
  • Oh, Jong Min;
  • Cai, Jangbom;
  • Kim, Byung Sung
  • 2018-01-01
  • Journal of Ceramic Processing Research, Vol.19 No.4, pp.290-295
  • Hanyang University
MIT characteristic of VO2 thin film deposited by ALD using vanadium oxytriisopropoxide precursor and H2O reactant
  • Shin, Changhee;
  • Lee, Namgue;
  • Choi, Hyeongsu;
  • Park, Hyunwoo;
  • Jung, Chanwon;
  • Song, Seokhwi;
  • Yuk, Hyunwoo;
  • Kim, Youngjoon;
  • Kim, Jong Woo;
  • Kim, Keunsik;
et al
  • 2019-10-01
  • Journal of Ceramic Processing Research, Vol.20 No.5, pp.484-489
  • Hanyang University
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