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Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al2O3with a Series of Al(CH3)xCl3- xand Al(CyH2 y+1)3Precursors- Oh, Il Kwon;
- Sandoval, Tania E.;
- Liu, Tzu Ling;
- Richey, Nathaniel E.;
- Nguyen, Chi Thang;
- Gu, Bonwook;
- Lee, Han Bo Ram;
- Tonner-Zech, Ralf;
- Bent, Stacey F.
- 2022-07-06
- Journal of the American Chemical Society, Vol.144 No.26, pp.11757-11766
- American Chemical Society
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