Showing results 1 to 6 of 6
Atomic layer deposition of high-k and metal thin films for high-performance DRAM capacitors: A brief review- Kim, Se Eun;
- Sung, Ju Young;
- Yun, Yewon;
- Jeon, Byeongjun;
- Moon, Sang Mo;
- Lee, Han Bin;
- Lee, Chae Hyun;
- Jung, Hae Jun;
- Lee, Jae Ung;
- Lee, Sang Woon
- 2024-08-01
- Current Applied Physics, Vol.64, pp.8-15
- Elsevier B.V.
Field-Effect Device Using Quasi-Two-Dimensional Electron Gas in Mass-Producible Atomic-Layer-Deposited Al2O3/TiO2 Ultrathin (<10 nm) Film Heterostructures- Seok, Tae Jun;
- Liu, Yuhang;
- Jung, Hae Jun;
- Kim, Soo Bin;
- Kim, Dae Hyun;
- Kim, Sung Min;
- Jang, Jae Hyuck;
- Cho, Deok Yong;
- Lee, Sang Woon;
- Park, Tae Joo
- 2018-01-01
- ACS Nano, Vol.12 No.10, pp.10403-10409
- American Chemical Society
Influences of surface treatment on In0.53Ga0.47As epitaxial layer grown on silicon substrate using trimethylaluminum- Kim, Soo Bin;
- Lee, Seung Hyun;
- Jung, Hae Jun;
- Seo, Myung Su;
- Kim, Sung Min;
- Lee, Soonil;
- Park, Ji Yong;
- Park, Tae Joo;
- Jeong, Hae Yong;
- Jun, Dong Hwan;
et al
- 2018-01-31
- Thin Solid Films, Vol.646, pp.173-179
- Elsevier B.V.
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