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Chemical mechanism of formation of two-dimensional electron gas at the Al2O3/TiO2 interface by atomic layer depositionoa mark
  • Park, Jeongwoo;
  • Eom, Hyobin;
  • Kim, Seong Hwan;
  • Seok, Tae Jun;
  • Park, Tae Joo;
  • Lee, Sang Woon;
  • Shong, Bonggeun
  • 2021-12-01
  • Materials Today Advances, Vol.12
  • Elsevier Ltd
Formation of oxygen vacancy at surfaces of ZnO by trimethylaluminumoa mark
  • Eom, Hyobin;
  • Bae, Woojin;
  • Sung, Ju Young;
  • Choi, Ji Hyeon;
  • Dae, Kyun Seong;
  • Jang, Jae Hyuck;
  • Park, Tae Joo;
  • Lee, Sang Woon;
  • Shong, Bonggeun
  • 2024-03-01
  • APL Materials, Vol.12 No.3
  • American Institute of Physics
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